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ungsten Target
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ungsten Target
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Tungsten targets produced by Achemetal Tungsten & Molybdenum Co., Ltd. include tungsten plane targets (tungsten round targets and tungsten strip-type targets) and tungsten rotating targets.
Tungsten plane targets are formed by processing high-quality plates of our company, and feature high density, no crack and sand hole inside, bright surfaces, uniform color and luster as well as accurate dimensions.
Small tungsten rotary pressing targets are processed by high-quality bars, and feature accurate dimensions, smooth surface, high purity, etc.
Tungsten rotating targets of the conventional size are produced by a hot isostatic pressing process, and feature high density (19.25 g/cm3), fine grains and good molding.
Conventional density: 19g/cm³~19.2g/cm³;
Special process density: more than 19.25g/cm³.
The tungsten targets have the following parameters:
Tungsten Target Parameters | ||||
| Element | W | |||
| Purity | ≥99.95%(3N5) | |||
| Typical sample dimension | 12mm×80mm×100mm | |||
| Density | 19.25 g/cm3 (HIP) | |||
| Hardness | HV5:280-310 | |||
| Grain Size | 43μm | |||
| Appearance | Ra≤0.4μm | |||
Impurity Content | Ti | ≤10ppm | Ni | ≤6ppm |
Na | ≤5ppm | Pb | ≤1ppm | |
C | ≤20ppm | P | ≤8ppm | |
Ca | ≤10ppm | Cu | ≤5ppm | |
Mg | ≤7ppm | |||
Si | ≤10ppm | |||
Al | ≤5ppm | |||
As | ≤10ppm | |||
Fe | ≤10ppm | |||
Note: all the specifications can meet the requirements of customers on high accuracy through machining.
The tungsten targets of our company are mainly applied to:
▲Thin-film solar industry, touch control industry, semiconductor industry, optical coating industry
Related Products
Specializing in tungsten, molybdenum and its alloy products deep production and processing as well as vacuum furnace and target manufacturing of high-tech enterprises
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