Niobium Target
Features of niobium targets manufactured by Achemetal
1. high product density, good product compactness and uniform crystal grains;
2. Higher machining property;
3. Relative density of targets: over 99%, relative density of alloy: over 97%; grain size: less than 50um; thermal resistance of films: below 5%; welded rate with back plates: over 98%, film uniformity after target film formation: over 95%.
4. Conventional density: ≥8.5 g/cm3;
Niobium Target Parameters |
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Element |
Nb |
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Typical sample dimension |
8mm×100mm×320mm |
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Purity |
>99.9%(3N) |
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Density |
~8.56g/cm3(HIP) |
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Hardness |
HV5:287-307 |
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Grain Size |
38μm |
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Appearance |
Ra≤0.4μm |
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Impurity Content |
Ta |
≤500ppm |
Cr |
≤20ppm |
N |
≤370ppm |
H |
≤19ppm |
|
Ni |
≤20ppm |
Fe |
≤80ppm |
|
Ti |
≤20ppm |
Mo |
≤30ppm |
|
W |
≤50ppm |
Cu |
≤10ppm |
|
Mn |
≤20ppm |
Al |
≤20ppm |
|
C |
≤260ppm |
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Si |
≤20ppm |
Note: all the specifications can meet the requirements of customers on high accuracy through machining.
Our niobium targets are mainly applied to:
▲Thin-film solar industry, touch control industry, glass industry, semiconductor industry, optical coating industry.